DocumentCode
3294329
Title
Failure analysis of VDMOS in DC/DC converter
Author
Liu, Y. ; Huang, Ch Y. ; Shan, N.N. ; Lu, Ch Zh ; Gao, G.B.
Author_Institution
Dept. of Electron. Inf. & Control Eng., Beijing Univ. of Technol., Beijing, China
fYear
2009
fDate
6-10 July 2009
Firstpage
388
Lastpage
392
Abstract
In this paper, the failure mechanism of VDMOS in DC/DC converter was analyzed in detail. The result was gained by the reliability project that included reliability experiment and reliability analysis. The VDMOS devices were used in the circuit of DC/DC converter which can achieve the function of 28 V into 15 V. The accelerated life test was imposed on the VDMOS of the circuit, which has the temperature stress 5degC/day and the electrical stress. The test was began at 75degC, and the VDMOS devices failed at 215degC. Then the failure analysis which recurred to the failure analysis tools such as the photon emission analysis (PEM) and the physical failure analysis (PFA) to the failed device showed the failure mechanism which is junction-break-down leakage inside source contact, under source wire bond. And the possible root cause of failure probably is Al spiking / diffusion into source contact causing junction leakage under reliability test condition of bias and temp. So in this way, the reliability of VDMOS in DC/DC converter can be tested and evaluated effectively.
Keywords
DC-DC power convertors; MOSFET; failure analysis; life testing; thermal stresses; DC-DC converter; VDMOS devices; accelerated life test; diffusion; electrical stress; junction-break-down leakage; photon emission analysis; physical failure analysis; reliability analysis; source contact; source wire bond; spiking; temperature 215 degC; temperature 75 degC; temperature stress; voltage 15 V; voltage 28 V; Circuit testing; DC-DC power converters; Failure analysis; Filters; Life estimation; Life testing; Pulse width modulation; Stress; Temperature; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location
Suzhou, Jiangsu
ISSN
1946-1542
Print_ISBN
978-1-4244-3911-9
Electronic_ISBN
1946-1542
Type
conf
DOI
10.1109/IPFA.2009.5232626
Filename
5232626
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