DocumentCode :
3294616
Title :
The Research of Temperature characteristics of SiGe HBT and the Reliability under Thermal Stress
Author :
Yang Wei-ming ; Yang Wu-tao ; Chen, Jian-Xin ; Chen Jian-xin
Author_Institution :
Sch. of Phys. & Electron. Technol., Hubei Univ., Wuhan, China
fYear :
2009
fDate :
6-10 July 2009
Firstpage :
319
Lastpage :
322
Abstract :
The temperature characteristics of SiGe HBT and its reliability under thermal stress are studied. The experiment results indicate that the current gain at 77 K is much larger than the one at 290 K. And there is a critical value of IC, which is 2times10-4A. Over this value, the gain increases with the decrease of the temperature. But below the value, the gain drops with the decrease of the temperature. The current ideal factor is smaller than 2 when the temperature is over 193 K, but larger than 2 at 193 K or below. Besides this, the thermal stress experiments for the base-emitter junction were taken under 100degC and 150degC, and the stress time was 90 hours and 30 hours, respectively. The experiment results indicate that the device characteristic parameters fluctuate under the different thermal stress conditions. The annealing and degeneration play the collective role in the characteristics fluctuating under the thermal stress condition.
Keywords :
Ge-Si alloys; circuit reliability; heterojunction bipolar transistors; semiconductor materials; thermal stresses; HBT; SiGe; annealing; base-emitter junction; current gain; heterojunction bipolar transistors; temperature 100 degC; temperature 150 degC; temperature 290 K; temperature 77 K; temperature characteristics; thermal stress; thermal stress condition; time 30 hour; time 90 hour; Aluminum; Doping; Electrodes; Gallium arsenide; Germanium silicon alloys; Heterojunction bipolar transistors; Manufacturing processes; Silicon germanium; Temperature; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location :
Suzhou, Jiangsu
ISSN :
1946-1542
Print_ISBN :
978-1-4244-3911-9
Electronic_ISBN :
1946-1542
Type :
conf
DOI :
10.1109/IPFA.2009.5232641
Filename :
5232641
Link To Document :
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