Title :
The ROI of Metrology
Author :
Bunday, Ben ; Allgair, John ; Caldwell, Mark ; Archie, Chas ; Solecky, Eric ; Rice, Bryan ; Singh, Bhanwar ; Emami, Lraj
Author_Institution :
Int. SEMATECH Manuf. Initiative, Austin
Abstract :
The conventional premise that metrology is a "non-value-added necessary evil" is a misleading one, which must be viewed as obsolete thinking. Much of the metrology requirements are now key enablers to traditionally labeled "value-added" processing steps in lithography and etch, such that they can be considered integral parts of the processes. This paper explore the present and future trends and challenges in CD metrology. However, equipment is only part of the battle. The quality application of these tools in a production environment is quite important; the ultimate value-added by metrology is a result of quality tools run by a quality metrology team using quality practices.
Keywords :
lithography; scanning electron microscopes; semiconductor device manufacture; semiconductor device measurement; critical dimension; lithography; metrology return on investment; non-value-added necessary evil; production environment; scanning electron microscope; value-added processing steps; Calibration; Etching; Lithography; Measurement errors; Measurement uncertainty; Metrology; Monitoring; Productivity; Scanning electron microscopy; Semiconductor device manufacture;
Conference_Titel :
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-4-9904138-0-4
DOI :
10.1109/ISSM.2006.4493115
