The ROI of Metrology

Author

Bunday, Ben ; Allgair, John ; Caldwell, Mark ; Archie, Chas ; Solecky, Eric ; Rice, Bryan ; Singh, Bhanwar ; Emami, Lraj

Author_Institution

Int. SEMATECH Manuf. Initiative, Austin

fYear

2006

fDate

25-27 Sept. 2006

Firstpage

387

Lastpage

390

Abstract

The conventional premise that metrology is a "non-value-added necessary evil" is a misleading one, which must be viewed as obsolete thinking. Much of the metrology requirements are now key enablers to traditionally labeled "value-added" processing steps in lithography and etch, such that they can be considered integral parts of the processes. This paper explore the present and future trends and challenges in CD metrology. However, equipment is only part of the battle. The quality application of these tools in a production environment is quite important; the ultimate value-added by metrology is a result of quality tools run by a quality metrology team using quality practices.

Keywords

lithography; scanning electron microscopes; semiconductor device manufacture; semiconductor device measurement; critical dimension; lithography; metrology return on investment; non-value-added necessary evil; production environment; scanning electron microscope; value-added processing steps; Calibration; Etching; Lithography; Measurement errors; Measurement uncertainty; Metrology; Monitoring; Productivity; Scanning electron microscopy; Semiconductor device manufacture;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on

Conference_Location

Tokyo

ISSN

1523-553X

Print_ISBN

978-4-9904138-0-4

Type

conf

DOI

10.1109/ISSM.2006.4493115

Filename

4493115