The Static Elimination System with Soft X-ray Air Ionizer Used in ULSI Cleanroom

Author

Sakuyama, Masafumi ; Takeuchi, Manabu ; Terasige, Takashi ; Ujiie, Shouta ; Okano, Kazuo

Author_Institution

Ibaraki Univ., Mito

fYear

2006

fDate

25-27 Sept. 2006

Firstpage

424

Lastpage

427

Abstract

Soft X-ray air ionizers are widely used for static control in semiconductor manufacturing processes because of the contamination free ionizer. However, the positive ions and the negative ions would recombine each other in transport process. In addition, the elimination time that is the time for eliminating charged bodies would get longer. So we propose the static elimination system with a soft X-ray air ionizer in order to reduce the effect of recombination and shorten the elimination time. The static elimination system was designed, made, and evaluated. As a result, the elimination time of the system operated under the optimum condition is 2.5 times shorter than a conventional soft X-ray air ionizer.

Keywords

ULSI; X-rays; clean rooms; integrated circuit manufacture; ULSI cleanroom; charged bodies; contamination free ionizer; negative ions; positive ions; semiconductor manufacturing processes; soft X-ray air ionizer; static control; static elimination system; transport process; Contamination; Control systems; Current measurement; Pollution measurement; Radiative recombination; Tellurium; Time measurement; Ultra large scale integration; Voltage control; Voltage measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on

Conference_Location

Tokyo

ISSN

1523-553X

Print_ISBN

978-4-9904138-0-4

Type

conf

DOI

10.1109/ISSM.2006.4493126

Filename

4493126