Title :
A new FA method used for OTP disturbance failure
Author :
Changqing, Chen ; Boon, Ang Ghim ; Teo, Angela ; Ping, Neo Soh ; Qingxiao, Wang
Author_Institution :
Global Foundries, Singapore, Singapore
Abstract :
In this paper, a new FA method was proposed and successfully used in the OTP (one time programmable) memory disturbance failure. The traditional FA method PVC (positive voltage contrast) is employed to detect the failed location, but it failed to find it. The more sensitive method, AFP biased current image was also failed to locate the failed location. The new method uses the light to stimulus the sample, and use AFP to scan and measure the induced current. The abnormal contrast was observed. The EFA was performed to probe the failed location to breakdown. The result show the breakdown voltage is lower than good unit. Further PFA was performed to find the Silicon-related defects, which also confirm the success of this method.
Keywords :
MOS memory circuits; PROM; failure analysis; integrated circuit reliability; AFP biased current image; OTP disturbance failure; PVC; Si-related defects; abnormal contrast; breakdown voltage; light-induced current; one time programmable memory disturbance failure; positive voltage contrast; Current measurement; Electric breakdown; Electrons; Failure analysis; Foundries; Nonvolatile memory; Page description languages; Probes; Voltage; Wood industry;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2010 17th IEEE International Symposium on the
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-5596-6
DOI :
10.1109/IPFA.2010.5532005