DocumentCode :
3296220
Title :
A new FA method used for OTP disturbance failure
Author :
Changqing, Chen ; Boon, Ang Ghim ; Teo, Angela ; Ping, Neo Soh ; Qingxiao, Wang
Author_Institution :
Global Foundries, Singapore, Singapore
fYear :
2010
fDate :
5-9 July 2010
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, a new FA method was proposed and successfully used in the OTP (one time programmable) memory disturbance failure. The traditional FA method PVC (positive voltage contrast) is employed to detect the failed location, but it failed to find it. The more sensitive method, AFP biased current image was also failed to locate the failed location. The new method uses the light to stimulus the sample, and use AFP to scan and measure the induced current. The abnormal contrast was observed. The EFA was performed to probe the failed location to breakdown. The result show the breakdown voltage is lower than good unit. Further PFA was performed to find the Silicon-related defects, which also confirm the success of this method.
Keywords :
MOS memory circuits; PROM; failure analysis; integrated circuit reliability; AFP biased current image; OTP disturbance failure; PVC; Si-related defects; abnormal contrast; breakdown voltage; light-induced current; one time programmable memory disturbance failure; positive voltage contrast; Current measurement; Electric breakdown; Electrons; Failure analysis; Foundries; Nonvolatile memory; Page description languages; Probes; Voltage; Wood industry;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2010 17th IEEE International Symposium on the
Conference_Location :
Singapore
ISSN :
1946-1542
Print_ISBN :
978-1-4244-5596-6
Type :
conf
DOI :
10.1109/IPFA.2010.5532005
Filename :
5532005
Link To Document :
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