DocumentCode :
329716
Title :
Performance evaluation of the thin film area in an IC wafer fabrication system using Petri nets
Author :
Der Jeng, Mu ; Chuang, Chi Liang ; Hung, Wen Yuan
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Ocean Univ., Taiwan
Volume :
4
fYear :
1998
fDate :
11-14 Oct 1998
Firstpage :
3094
Abstract :
We use Petri nets to model and evaluate the performance of the thin film area in a real-word IC wafer fabrication system. The major products of the system are 0.44 μm and 0.38 μm 4MB DRAMs. By using a modular approach, the system model is constructed. Several generic net modules are developed. After the system model is obtained, we use the simulation technique to evaluate its performance. The result shows that the error between an actual and simulated machine utilization is mostly less than 6%. As a result, the performance model is validated. The validated model has been adopted to predict the maximal throughput and bottleneck machines
Keywords :
Petri nets; integrated circuit manufacture; production control; simulation; thin film devices; DRAM; IC manufacture; IC wafer fabrication; Petri nets; generic net modules; performance evaluation; simulation; thin film; Etching; Fabrication; Integrated circuit modeling; Petri nets; Predictive models; Production facilities; Semiconductor device modeling; Throughput; Transistors; Transportation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Systems, Man, and Cybernetics, 1998. 1998 IEEE International Conference on
Conference_Location :
San Diego, CA
ISSN :
1062-922X
Print_ISBN :
0-7803-4778-1
Type :
conf
DOI :
10.1109/ICSMC.1998.726477
Filename :
726477
Link To Document :
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