DocumentCode :
3297380
Title :
Si-substrate Modeling toward Substrate-aware Interconnect Resistance and Inductance Extraction in SoC Design
Author :
Kanamoto, Toshiki ; Ikeda, Tatsuhiko ; Tsuchiya, Akira ; Onodera, Hidetoshi ; Hashimoto, Masanori
Author_Institution :
RENESAS Technol.
fYear :
2006
fDate :
9-12 May 2006
Firstpage :
227
Lastpage :
230
Abstract :
This paper proposes a simple yet sufficient Si-substrate modeling for interconnect resistance and inductance extraction. The proposed modeling expresses Si-substrate as four filaments in a filament-based extractor. Although the number of filaments is small, extracted loop inductances and resistances show accurate frequency dependence resulting from the proximity effect. We experimentally prove the accuracy using FEM (finite element method) based simulations of electromagnetic fields. We also show a method to determine optimal size of the four filaments. The proposed model realizes substrate-aware extraction in SoC design flow
Keywords :
electromagnetic fields; elemental semiconductors; finite element analysis; integrated circuit design; integrated circuit interconnections; integrated circuit modelling; silicon; system-on-chip; FEM; Si; Si-substrate modeling; SoC design; electromagnetic fields; filament-based extractor; finite element method; inductance extraction; proximity effect; substrate-aware interconnect resistance; Circuit simulation; Conductivity; Electrical resistance measurement; Frequency dependence; Frequency measurement; Inductance measurement; Integrated circuit interconnections; Proximity effect; Semiconductor device modeling; Skin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Signal Propagation on Interconnects, 2006. IEEE Workshop on
Conference_Location :
Berlin, Germany
Print_ISBN :
1-4244-0455-x
Electronic_ISBN :
1-4244-0455-x
Type :
conf
DOI :
10.1109/SPI.2006.289229
Filename :
4069464
Link To Document :
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