Title :
Session: plasma chemistry
Abstract :
The following topics are dealt with: RF driven parallel plate reactor electron dynamics, CF/sub 4/ conical theta plasma for pulsed etching of microelectronic materials, XeO microwave discharge excitation, trench etching in Si, sidewall angle control, plasma source for Fourier transform mass spectrometry, organic molecules modification.<>
Keywords :
Fourier transform spectroscopy; carbon compounds; excimers; high-frequency discharges; mass spectrometers; molecular dissociation; molecular excited states; organic compounds; pinch effect; plasma production; plasma transport processes; silicon; sputter etching; xenon compounds; Fourier transform mass spectrometry; RF driven parallel plate reactor; Si; XeO; conical theta plasma; dissociation; electron dynamics; microelectronic materials; microwave discharge excitation; organic molecules; plasma source; plasma transport; pulsed etching; sidewall angle control; sputter etching; tetrafluoromethane; trench etching; Carbon compounds; Charge carrier processes; Fourier spectroscopy; Gas discharges; Mass spectroscopy; Organic compounds; Plasma generation; Plasma pinch; Plasma properties; Silicon; Sputter etching; Xenon;
Conference_Titel :
Plasma Science, 1988. IEEE Conference Record - Abstracts., 1988 IEEE International Conference on
Conference_Location :
Seattle, WA, USA
DOI :
10.1109/PLASMA.1988.132262
