DocumentCode :
3300072
Title :
Defects in GaN film grown on Si (100) substrate
Author :
Zainal, Norzaini ; Zaini, S.N.W.M. ; Yusof, Mohd Nuru Ehsan ; Alias, Ezzah Azimah ; Radzali, Rosfariza ; Hassan, Zainuriah
Author_Institution :
Sch. of Phys., Univ. Sains Malaysia, Minden, Malaysia
fYear :
2012
fDate :
5-7 Jan. 2012
Firstpage :
1
Lastpage :
2
Abstract :
The authors study the presence defects in a GaN thin film, which was grown on Si (100) substrate using molecular beam epitaxy (MBE). The optical, structural and electrical characteristics of the sample are observed via photoluminescence (PL), X-ray diffraction (XRD), scanning electron microscopy (SEM) and Hall-effect measurements. From the measurements, the presence of cubic inclusions and the behavior of the defect in the sample have been identified.
Keywords :
Hall effect; III-V semiconductors; X-ray diffraction; gallium compounds; inclusions; molecular beam epitaxial growth; photoluminescence; scanning electron microscopy; semiconductor epitaxial layers; semiconductor growth; wide band gap semiconductors; GaN; Hall-effect; SEM; Si; Si(100) substrate; X-ray diffraction; XRD; cubic inclusions; electrical properties; molecular beam epitaxy; optical properties; photoluminescence; scanning electron microscopy; semiconductor defects; structural properties; thin film; Gallium nitride; Molecular beam epitaxial growth; Nanotechnology; Silicon; Substrates; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Enabling Science and Nanotechnology (ESciNano), 2012 International Conference on
Conference_Location :
Johor Bahru
Print_ISBN :
978-1-4577-0799-5
Type :
conf
DOI :
10.1109/ESciNano.2012.6149641
Filename :
6149641
Link To Document :
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