Title :
InGaN-based multi-quantum well blue-violet light emitting diode
Author :
Ali, Ahmad Hadi ; Abu Bakar, Ahmad Shuhaimi bin ; Hassan, Zainuriah
Abstract :
The InGaN-based multi-quantum well (MQW) blue-violet LED grown by metal organic chemical vapor deposition (MOCVD) was studied.The LED structure was grown on Si (111) substrate with AlN buffer layer, followed by 40 pairs of AIN/GaN intermediate layer with respective thickness of 5 nm and 20 nm. Subsequently, a 600 nm thick AlGaN/GaN strained-layer superlattices (SLSs) cladding underlayer was grown which consist of 120 pairs SLSs. Then, 60 nm GaN waveguide, 2.0 nm InGaN MQW active layer, 30 nm InGaN over layer and 10 nm GaN were deposited subsequently. Light emission characteristics from photoluminescence (PL) analysis show emission wavelength with main peak at 423 nm and intensity of 2725 x 103 a.u.
Keywords :
III-V semiconductors; MOCVD; X-ray chemical analysis; X-ray diffraction; aluminium compounds; gallium compounds; indium compounds; light emitting diodes; photoluminescence; quantum well devices; wide band gap semiconductors; InGaN-AlN-GaN; LED structure; MOCVD; MQW; Si; metal organic chemical vapor deposition; multiquantum well blue-violet light emitting diode; photoluminescence; size 10 nm; size 2.0 nm; size 20 nm; size 30 nm; size 5 nm; size 60 nm; size 600 nm; Gallium nitride; Light emitting diodes; Nanotechnology; Optical devices; Quantum well devices; X-ray diffraction; X-ray scattering;
Conference_Titel :
Enabling Science and Nanotechnology (ESciNano), 2012 International Conference on
Conference_Location :
Johor Bahru
Print_ISBN :
978-1-4577-0799-5
DOI :
10.1109/ESciNano.2012.6149695