• DocumentCode
    3301957
  • Title

    Advanced IC fabrication technology using reliable, small-size, and high-speed AlGaAs/GaAs HBTs

  • Author

    Nittono, T. ; Nagata, K. ; Yamauchi, Y. ; Makimura, T. ; Ito, H. ; Nakajima, O.

  • Author_Institution
    NTT LSI Labs., Kanagawa, Japan
  • fYear
    1991
  • fDate
    8-11 Dec. 1991
  • Firstpage
    931
  • Lastpage
    934
  • Abstract
    Reliable, small-size, and high-speed AlGaAs/GaAs HBTs (heterojunction bipolar transistors) have been developed using a carbon-doped thin base layer and O/sup +/-implant E/B (emitter/base) junction isolation. This isolation reduces the recombination current at the implanted edge, resulting in improved current gain. The use of carbon dopant for the base layer improves device reliability. A thin (0.04 mu m) base reduces base transit time, making it possible to achieve a high cutoff frequency of 103 GHz. A one-by-eight static frequency divider and a one-by-four/one-by-five two-modulus prescaler fabricated to investigate circuit performance successfully operated over 10 GHz. The 1- mu m*2.4- mu m emitters used in the divider are the smallest HBT applied to ICs ever reported. This result indicates that the proposed technology is promising for the development of reliable and high-speed HBT ICs.<>
  • Keywords
    III-V semiconductors; aluminium compounds; bipolar integrated circuits; frequency dividers; gallium arsenide; heterojunction bipolar transistors; integrated circuit technology; ion implantation; scaling circuits; solid-state microwave devices; 10 GHz; 103 GHz; AlGaAs-GaAs; AlGaAs:O/sup +/-GaAs:C; HBTs; IC fabrication technology; base transit time; current gain; cutoff frequency; high-speed HBT ICs; implanted emitter base junction isolation; recombination current; reliability; static frequency divider; two-modulus prescaler; Cutoff frequency; Electrodes; Fabrication; Frequency conversion; Gallium arsenide; Heterojunction bipolar transistors; High speed integrated circuits; Indium tin oxide; Large scale integration; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0243-5
  • Type

    conf

  • DOI
    10.1109/IEDM.1991.235273
  • Filename
    235273