DocumentCode
3302181
Title
Modeling and simulation of plasma processes
Author
Graves, D.B. ; Surendra, M.
Author_Institution
Dept. of Chem. Eng., California Univ., Berkeley, CA, USA
fYear
1991
fDate
8-11 Dec. 1991
Firstpage
887
Lastpage
890
Abstract
Some of the basic problems in modeling gas discharges between parallel plate electrodes are outlined. These problems are then illustrated with results from simulations of helium discharges in one spatial dimension.<>
Keywords
discharges (electric); helium; plasma simulation; semiconductor process modelling; semiconductor technology; 1D simulations; He discharges; gas discharges; modeling; parallel plate electrodes; plasma processes; simulation; Discharges; Electrodes; Electrons; Helium; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma simulation; Sputter etching; Surface cleaning;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location
Washington, DC, USA
ISSN
0163-1918
Print_ISBN
0-7803-0243-5
Type
conf
DOI
10.1109/IEDM.1991.235283
Filename
235283
Link To Document