DocumentCode :
3303019
Title :
A multiple-valued SRAM with combined single-electron and MOS transistors
Author :
Inokawa, H. ; Fujiwara, A. ; Takahashi, Y.
Author_Institution :
NTT Basic Res. Labs., Kanagawa, Japan
fYear :
2001
fDate :
25-27 June 2001
Firstpage :
129
Lastpage :
130
Abstract :
Reports a new type of single-electron memory that works as a multiple-valued SRAM. A schematic of the proposed memory is shown. The source of a MOSFET with fixed gate bias V/sub gg/ is connected to the drain of a single-electron transistor (SET), and the SET drain voltage is kept nearly constant around V/sub gg/-V/sub th/, where V/sub th/ is the threshold voltage of the MOSFET. This V/sub gg/-V/sub th/ is set low enough to sustain the Coulomb-blockade condition. By connecting the SET gate to the MOSFET drain, the I/sub d/-V/sub gs/, (3-terminal) characteristics of the SET are converted to the I-V (2-terminal) characteristics of the combined SET-MOSFET circuit. With a proper choice of load device, the periodic nature of the I-V characteristics results in a number of stability points, and this realizes the multiple-valued memory operation.
Keywords :
CMOS memory circuits; Coulomb blockade; MOSFET; SRAM chips; characteristics measurement; multivalued logic; semiconductor device measurement; single electron transistors; 3-terminal characteristics; Coulomb-blockade condition; I-V characteristics; MOSFET; SET drain voltage; combined single-electron/MOS transistors; fixed gate bias; load device; multiple-valued SRAM; periodic nature; single-electron transistor; stability points; threshold voltage; Capacitance; Circuit stability; Joining processes; Laboratories; MOSFET circuits; Random access memory; Silicon on insulator technology; Single electron memory; Threshold voltage; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2001
Conference_Location :
Notre Dame, IN, USA
Print_ISBN :
0-7803-7014-7
Type :
conf
DOI :
10.1109/DRC.2001.937900
Filename :
937900
Link To Document :
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