• DocumentCode
    3303355
  • Title

    A coupled Schrodinger/Monte Carlo technique for quantum-corrected device simulation

  • Author

    Winstead, B. ; Ravaioli, U.

  • Author_Institution
    Beckman Inst., Illinois Univ., Urbana, IL, USA
  • fYear
    2001
  • fDate
    25-27 June 2001
  • Firstpage
    169
  • Lastpage
    170
  • Abstract
    The authors present a new model for quantum-corrected full-band Monte Carlo device simulation which accounts for quantum repulsion at the silicon/gate-insulator interface through a self-consistent coupling with the Schrodinger equation. In a coupled Monte Carlo-Schrodinger simulation, the Schrodinger equation is periodically solved along 1-D slices of a 2-D domain. The quantum concentration slices are regarded as envelope functions for the Monte Carlo solution, and the Monte Carlo potential is corrected to reflect their shape. The correction is formulated in such a way that it is not a function of the particular magnitude of the quantum concentration, and thus there is no problem posed by the absence of the fermi level concept in a Monte Carlo model. In this work, the Monte Carlo-Schrodinger method is applied to a MOS capacitor for a wide range of biases, and is compared to self-consistent Schrodinger-Poisson calculations for validation. Preliminary results for a 2-D MOSFET simulation are also presented.
  • Keywords
    MOS capacitors; MOSFET; Monte Carlo methods; Poisson equation; Schrodinger equation; elemental semiconductors; quantum interference phenomena; semiconductor device models; silicon; 2-D MOSFET; MOS capacitor; Schrodinger equation; Si; coupled Schrodinger/Monte Carlo technique; envelope functions; fermi level; full-band Monte Carlo device simulation; quantum repulsion; quantum-corrected device simulation; self-consistent Schrodinger-Poisson calculations; self-consistent coupling; silicon/gate-insulator interface; Coherence; Electron devices; MOS capacitors; MOSFETs; Monte Carlo methods; Quantization; Schrodinger equation; Silicon; Temperature; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2001
  • Conference_Location
    Notre Dame, IN, USA
  • Print_ISBN
    0-7803-7014-7
  • Type

    conf

  • DOI
    10.1109/DRC.2001.937918
  • Filename
    937918