• DocumentCode
    3303406
  • Title

    Monte Carlo/drift-diffusion coupling: non-equilibrium transport in deep submicron MOSFETs

  • Author

    Dubois, E. ; Bricout, P.H. ; Fauquembergue, R. ; Collard, D.

  • Author_Institution
    ISEN, CNRS, Lille, France
  • fYear
    1991
  • fDate
    8-11 Dec. 1991
  • Firstpage
    519
  • Lastpage
    522
  • Abstract
    Coupling between Monte Carlo and drift-diffusion methods is investigated on deep submicron MOSFETs. For this purpose, an extended formulation of the drift-diffusion current equation which includes an additional driving force, the so-called energy-gradient field, is used. It is shown that the energy-gradient field only contributes in the drain region where nonlocal effects prevail. Another illustration of nonequilibrium transport is also provided by the thermal voltage tensor which strongly modifies the diffusion term.<>
  • Keywords
    Monte Carlo methods; insulated gate field effect transistors; semiconductor device models; Monte Carlo/drift-diffusion coupling; deep submicron MOSFETs; drain region; drift-diffusion current equation; energy-gradient field; nonequilibrium transport; nonlocal effects; thermal voltage tensor; Acoustic scattering; Analytical models; Anisotropic magnetoresistance; Electrons; Equations; MOSFETs; Monte Carlo methods; Phonons; Tensile stress; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0243-5
  • Type

    conf

  • DOI
    10.1109/IEDM.1991.235342
  • Filename
    235342