DocumentCode
3303406
Title
Monte Carlo/drift-diffusion coupling: non-equilibrium transport in deep submicron MOSFETs
Author
Dubois, E. ; Bricout, P.H. ; Fauquembergue, R. ; Collard, D.
Author_Institution
ISEN, CNRS, Lille, France
fYear
1991
fDate
8-11 Dec. 1991
Firstpage
519
Lastpage
522
Abstract
Coupling between Monte Carlo and drift-diffusion methods is investigated on deep submicron MOSFETs. For this purpose, an extended formulation of the drift-diffusion current equation which includes an additional driving force, the so-called energy-gradient field, is used. It is shown that the energy-gradient field only contributes in the drain region where nonlocal effects prevail. Another illustration of nonequilibrium transport is also provided by the thermal voltage tensor which strongly modifies the diffusion term.<>
Keywords
Monte Carlo methods; insulated gate field effect transistors; semiconductor device models; Monte Carlo/drift-diffusion coupling; deep submicron MOSFETs; drain region; drift-diffusion current equation; energy-gradient field; nonequilibrium transport; nonlocal effects; thermal voltage tensor; Acoustic scattering; Analytical models; Anisotropic magnetoresistance; Electrons; Equations; MOSFETs; Monte Carlo methods; Phonons; Tensile stress; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location
Washington, DC, USA
ISSN
0163-1918
Print_ISBN
0-7803-0243-5
Type
conf
DOI
10.1109/IEDM.1991.235342
Filename
235342
Link To Document