• DocumentCode
    3303487
  • Title

    An isotropic best-fitting band model for electron and hole transport in silicon

  • Author

    Venturi, F. ; Abramo, A. ; Sangiorgi, E. ; Higman, J.M. ; Fiegna, C. ; Ricco, B.

  • Author_Institution
    Dept. of Inf. Technol., Parma Univ., Italy
  • fYear
    1991
  • fDate
    8-11 Dec. 1991
  • Firstpage
    503
  • Lastpage
    506
  • Abstract
    As isotropic model for the silicon band structure which accurately approximates both density of states and group velocity of the real anisotropic band structure and yields excellent agreement with both the collision and nonhomogeneous terms of the Boltzmann transport equation has been developed. The model, represented through a simple set of energy-wave vector tables, has been implemented in a Monte Carlo device simulator, but can also be extended to alternative methods for solving the Boltzmann equation. Simulations of homogeneous silicon bars show a very good agreement with available experimental data.<>
  • Keywords
    Boltzmann equation; Monte Carlo methods; band structure of crystalline semiconductors and insulators; band theory models and calculation methods; electronic density of states; elemental semiconductors; silicon; simulation; Boltzmann transport equation; Monte Carlo device simulator; Si; anisotropic band structure; density of states; electron transport; energy-wave vector tables; group velocity; hole transport; isotropic best-fitting band model; model; Anisotropic magnetoresistance; Bars; Boltzmann equation; Charge carrier processes; Computational modeling; Information technology; Microscopy; Monte Carlo methods; Scattering; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0243-5
  • Type

    conf

  • DOI
    10.1109/IEDM.1991.235346
  • Filename
    235346