DocumentCode :
3303487
Title :
An isotropic best-fitting band model for electron and hole transport in silicon
Author :
Venturi, F. ; Abramo, A. ; Sangiorgi, E. ; Higman, J.M. ; Fiegna, C. ; Ricco, B.
Author_Institution :
Dept. of Inf. Technol., Parma Univ., Italy
fYear :
1991
fDate :
8-11 Dec. 1991
Firstpage :
503
Lastpage :
506
Abstract :
As isotropic model for the silicon band structure which accurately approximates both density of states and group velocity of the real anisotropic band structure and yields excellent agreement with both the collision and nonhomogeneous terms of the Boltzmann transport equation has been developed. The model, represented through a simple set of energy-wave vector tables, has been implemented in a Monte Carlo device simulator, but can also be extended to alternative methods for solving the Boltzmann equation. Simulations of homogeneous silicon bars show a very good agreement with available experimental data.<>
Keywords :
Boltzmann equation; Monte Carlo methods; band structure of crystalline semiconductors and insulators; band theory models and calculation methods; electronic density of states; elemental semiconductors; silicon; simulation; Boltzmann transport equation; Monte Carlo device simulator; Si; anisotropic band structure; density of states; electron transport; energy-wave vector tables; group velocity; hole transport; isotropic best-fitting band model; model; Anisotropic magnetoresistance; Bars; Boltzmann equation; Charge carrier processes; Computational modeling; Information technology; Microscopy; Monte Carlo methods; Scattering; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0243-5
Type :
conf
DOI :
10.1109/IEDM.1991.235346
Filename :
235346
Link To Document :
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