Title :
An isotropic best-fitting band model for electron and hole transport in silicon
Author :
Venturi, F. ; Abramo, A. ; Sangiorgi, E. ; Higman, J.M. ; Fiegna, C. ; Ricco, B.
Author_Institution :
Dept. of Inf. Technol., Parma Univ., Italy
Abstract :
As isotropic model for the silicon band structure which accurately approximates both density of states and group velocity of the real anisotropic band structure and yields excellent agreement with both the collision and nonhomogeneous terms of the Boltzmann transport equation has been developed. The model, represented through a simple set of energy-wave vector tables, has been implemented in a Monte Carlo device simulator, but can also be extended to alternative methods for solving the Boltzmann equation. Simulations of homogeneous silicon bars show a very good agreement with available experimental data.<>
Keywords :
Boltzmann equation; Monte Carlo methods; band structure of crystalline semiconductors and insulators; band theory models and calculation methods; electronic density of states; elemental semiconductors; silicon; simulation; Boltzmann transport equation; Monte Carlo device simulator; Si; anisotropic band structure; density of states; electron transport; energy-wave vector tables; group velocity; hole transport; isotropic best-fitting band model; model; Anisotropic magnetoresistance; Bars; Boltzmann equation; Charge carrier processes; Computational modeling; Information technology; Microscopy; Monte Carlo methods; Scattering; Silicon;
Conference_Titel :
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-0243-5
DOI :
10.1109/IEDM.1991.235346