Title :
Physical basis and characteristics of light emission from quantized planar Ge structures
Author :
Venkatasubramanian, R. ; Malta, D.P. ; Timmons, M.L. ; Hutchby, J.A.
Author_Institution :
Research Triangle Inst., Research Triangle Park, NC, USA
Abstract :
The characteristics of luminescence from quantized planar Ge structures are presented, showing stability with time, dependence on laser power excitation and temperature, and the presence of GaAs-Al/sub 0.8/Ga/sub 0.2/As overlayers. A single broad emission at 1.7 eV near 300 K is observed to become four distinct emissions at 2.16 eV, 2.01 eV, 1.696 eV, and 1.56 eV at 77 K. A model describing the basis of luminescence in small Ge structures is also presented. The increased probability for radiative recombination in the quantized structures is a result of states in the conduction band and valence band being closed in k-space than in bulk Ge. Thus, the luminescence at 1.7 eV in the quantized structures probably results from a one or two phonon-assisted process compared to a 4-5 phonon process in bulk Ge for photoluminescence at 0.7 eV.<>
Keywords :
III-V semiconductors; aluminium compounds; conduction bands; electron-hole recombination; elemental semiconductors; gallium arsenide; germanium; luminescence of inorganic solids; nanotechnology; passivation; photoluminescence; semiconductor epitaxial layers; valence bands; 300 K; 77 K; Ge-GaAs-Al/sub 0.8/Ga/sub 0.2/As; broad emission; characteristics; conduction band; dependence on laser power excitation; distinct emissions; k-space; light emission; luminescence; photoluminescence; physical basis; quantized planar Ge structures; radiative recombination; semiconductors; stability with time; temperature dependence; valence band; visible light emission; Laser modes; Laser stability; Luminescence; Passivation; Plasma applications; Plasma confinement; Power lasers; Radiative recombination; Scanning electron microscopy; Silicon compounds;
Conference_Titel :
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-0243-5
DOI :
10.1109/IEDM.1991.235363