Title :
Extraction of the series resistances and effective channel length of GaAs MESFETs by means of electrical methods: a numerical study
Author :
Menozzi, R. ; Selmi, L. ; Gandolfi, P. ; Ricco, B.
Author_Institution :
Dept. of Inf. Eng., Parma Univ., Italy
Abstract :
The authors present a numerical study on electrical methods to measure the source and drain resistances and the effective channel length of state-of-the-art gallium arsenide MESFETs. In particular, the effects of scaling on the physical meaning and gate voltage dependence of the extracted values are investigated. Fringing effects at the gate edges are found to be responsible for a substantial bias dependence of the series resistances, and hence for possible inaccuracies of extraction procedures that overlook such phenomena. A novel extraction technique is also proposed to overcome in part the limitations of conventional approaches.<>
Keywords :
III-V semiconductors; Schottky gate field effect transistors; digital simulation; gallium arsenide; semiconductor device models; GaAs; GaAs MESFETs; bias dependence; drain resistance; effective channel length; effects of scaling; electrical methods; fringing effects; gate edges; gate voltage dependence; numerical study; parameter extraction technique; physical meaning; series resistances; source resistance; submicron MESFETs; Conductivity; Data mining; Electric variables measurement; Electrical resistance measurement; Electrodes; Gallium arsenide; Length measurement; MESFETs; Numerical simulation; Voltage;
Conference_Titel :
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-0243-5
DOI :
10.1109/IEDM.1991.235383