• DocumentCode
    3304824
  • Title

    High-performance microwave passive components on silicon substrate

  • Author

    Chen, Kevin J. ; Huo, Xiao ; Leung, Lydia L W ; Chan, Philip C.H.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., China
  • fYear
    2002
  • fDate
    17-19 Aug. 2002
  • Firstpage
    263
  • Lastpage
    266
  • Abstract
    High-Performance microwave passive components are demonstrated on standard silicon substrate incorporating a low-k Benzocyclobutene (BCB) layer. Metal ohmic loss and substrate coupling loss, the two major factors that degrade the on-chip passive components are suppressed by the employment of electroplated copper and the low-k BCB layer, respectively. Spiral inductors exhibit Q-factor as high as 25 at 2 GHz. A low-loss, low-pass microstrip transmission line based microwave filter has been fabricated. The filter has a cut-off frequency at 10 GHz with an insertion loss of -1.1 dB. The fabrication process is low-cost and low-temperature, making it suitable for post-IC process for high performance RFIC´s and MMIC´s.
  • Keywords
    Q-factor; elemental semiconductors; inductors; low-pass filters; microstrip filters; microwave filters; silicon; -1.1 dB; 10 GHz; 2 GHz; Cu; MMIC; Q-factor; RFIC; Si; cutoff frequency; electroplated copper; insertion loss; low-k BCB layer; low-loss low-pass microstrip transmission line; low-temperature fabrication process; metal ohmic loss; microwave filter; microwave passive component; silicon substrate; spiral inductor; substrate coupling loss; Copper; Couplings; Degradation; Employment; Inductors; Microstrip filters; Microwave filters; Q factor; Silicon; Spirals;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Millimeter Wave Technology, 2002. Proceedings. ICMMT 2002. 2002 3rd International Conference on
  • Print_ISBN
    0-7803-7486-X
  • Type

    conf

  • DOI
    10.1109/ICMMT.2002.1187686
  • Filename
    1187686