• DocumentCode
    3305032
  • Title

    On-chip picosecond time-domain measurement of silicon bipolar transistor characteristics using integrated GaAs photoconductive devices

  • Author

    Anderson, G.D. ; Dutton, R.W. ; Morse, J.D. ; Mariella, R.P., Jr.

  • Author_Institution
    Integrated Circuits Lab., Stanford Univ., CA, USA
  • fYear
    1991
  • fDate
    8-11 Dec. 1991
  • Firstpage
    37
  • Lastpage
    40
  • Abstract
    Picosecond time-domain measurements of silicon bipolar transistors have been performed using thin-film GaAs photoconductive switches integrated on-chip. Low temperature MBE (molecular beam epitaxy) growth techniques were used to fabricate the GaAs-on-silicon structures. These devices produced 5 ps full width at half maximum (FWHM) electrical pulses when excited by high-speed laser pulses. Results of using these optical switches to characterize 4 GHz bipolar transistors are presented. It is noted that the technique used here allows local testing of high-speed devices with a minimum for on-chip parasitics. Precise control of sampling using variable-length optical paths (off-chip) are not only convenient but isolate the device from the measurement set-up.<>
  • Keywords
    III-V semiconductors; bipolar transistors; gallium arsenide; photoconducting devices; semiconductor device testing; semiconductor switches; silicon; 4 GHz; GaAs-Si; bipolar transistor characteristics; electrical pulses; high-speed devices; high-speed laser pulses; integrated GaAs photoconductive devices; local testing; low temperature MBE growth; molecular beam epitaxy; onchip picosecond measurements; thin-film GaAs photoconductive switches; time-domain measurement; variable-length optical paths; Bipolar transistors; Molecular beam epitaxial growth; Optical pulses; Optical switches; Performance evaluation; Semiconductor thin films; Silicon; Space vector pulse width modulation; Thin film transistors; Time domain analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0243-5
  • Type

    conf

  • DOI
    10.1109/IEDM.1991.235429
  • Filename
    235429