DocumentCode :
3305614
Title :
Quantum transport simulations of electron field emission
Author :
Jensen, K.L. ; Ganguly, A.K.
Author_Institution :
US Naval Res. Lab., Washington, DC, USA
fYear :
1991
fDate :
8-11 Dec. 1991
Firstpage :
217
Lastpage :
220
Abstract :
The authors report on the comparison of various quantum transport calculations for metal-vacuum tunneling structures under high electric fields. Specifically, they compared the WKB approximation to the transmission coefficient (TC) for evaluating current-voltage relationships to the more accurate Airy function approach, and both of these approaches to the Wigner distribution function (WDF) approach to quantum transport. The purpose of this study is to examine electron transport through metal (or semiconductor)-vacuum interfaces and to assess the utility of various techniques for their incorporation into larger simulation packages, such as ensemble particle Monte Carlo. As the WDF has been used for the first time to study issues of interest to vacuum microelectronics, the authors assess its advantages and shortcomings.<>
Keywords :
Monte Carlo methods; WKB calculations; electron field emission; tunnelling; vacuum microelectronics; Airy function approach; WDF; WKB approximation; Wigner distribution function; current voltage characteristics; electron field emission; electron transport through metal vacuum interface; ensemble particle Monte Carlo; high electric fields; metal-vacuum tunneling structures; quantum transport simulations; semiconductor vacuum interface; simulation packages; transmission coefficient; vacuum microelectronics; Discrete event simulation; Electron emission; Elementary particle vacuum; Equations; Particle scattering; Semiconductor device packaging; Tunneling; Vacuum technology; Virtual manufacturing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0243-5
Type :
conf
DOI :
10.1109/IEDM.1991.235463
Filename :
235463
Link To Document :
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