Title :
Nature Of The Silicon And Silicon Dioxide Surfaces During Plasma Etching With Fluorocarbon Containing Discharges
Author :
Aydil, Eray S. ; Marra, Denise C.
Author_Institution :
University of California Santa Barbara
Keywords :
Etching; Hydrogen; Infrared spectra; Optical films; Plasma applications; Plasma diagnostics; Polymer films; Semiconductor films; Silicon compounds; Steady-state;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729911
