DocumentCode

330606

Title

Nature Of The Silicon And Silicon Dioxide Surfaces During Plasma Etching With Fluorocarbon Containing Discharges

Author

Aydil, Eray S. ; Marra, Denise C.

Author_Institution

University of California Santa Barbara

fYear

1998

fDate

13-16 July 1998

Firstpage

6

Lastpage

7

Keywords

Etching; Hydrogen; Infrared spectra; Optical films; Plasma applications; Plasma diagnostics; Polymer films; Semiconductor films; Silicon compounds; Steady-state;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729911

Filename

729911