DocumentCode

330607

Title

Novel Process Of SiO/sub 2//Si Selective Etching Using New Gas System Against Global Warning

Author

Hori, M. ; Fujita, K. ; Ito, M. ; Goto, T.

Author_Institution

Nagoya University

fYear

1998

fDate

13-16 July 1998

Firstpage

8

Lastpage

9

Keywords

Etching; Feeds; Gas lasers; Gases; Mass spectroscopy; Plasma applications; Plasma density; Plasma measurements; Plasma properties; Plasma sources;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729914

Filename

729914