DocumentCode

330610

Title

Al Etch And After-Corrosion Characteristics In A M = 0 Helicon Wave Plasma Etcher

Author

Ha, Jae Hyoun ; Yim, M.H. ; Kim, Jonghoon J.

Author_Institution

Central Research Laboratory, LG Semicon

fYear

1998

fDate

13-16 July 1998

Firstpage

14

Lastpage

15

Keywords

Aluminum; Cleaning; Corrosion; Etching; Plasma applications; Plasma measurements; Plasma properties; Plasma sources; Plasma waves; Strips;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729919

Filename

729919