DocumentCode :
330612
Title :
Mask Contamination Induced by X-Ray Exposure
Author :
Okada, I. ; Saitoh, Y. ; Deguchi, K. ; Fukuda, M. ; Ban, H. ; Matsuda, T.
Author_Institution :
NTT System Electronics Laboratories
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
17
Lastpage :
18
Keywords :
Coatings; Contamination; Energy resolution; Fabrication; Integrated circuit technology; Laboratories; Lithography; Resists; Ultraviolet sources; Water pollution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729923
Filename :
729923
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330612
بازگشت