DocumentCode
330614
Title
Dissolution Characteristics And Surface Morphology Of Chemically Amplified Positive Resists In X-Ray Lithography
Author
Nakamura, Jiro ; Kawai, Yoshio ; Deguchi, Kimiyoshi ; Matsuda, Tadahito
Author_Institution
NTT System Electronics Laboratories
fYear
1998
fDate
13-16 July 1998
Firstpage
21
Lastpage
22
Keywords
Atomic force microscopy; Chemical analysis; Laboratories; Resists; Rough surfaces; Surface contamination; Surface morphology; Surface roughness; X-ray imaging; X-ray lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.729926
Filename
729926
Link To Document