DocumentCode :
330614
Title :
Dissolution Characteristics And Surface Morphology Of Chemically Amplified Positive Resists In X-Ray Lithography
Author :
Nakamura, Jiro ; Kawai, Yoshio ; Deguchi, Kimiyoshi ; Matsuda, Tadahito
Author_Institution :
NTT System Electronics Laboratories
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
21
Lastpage :
22
Keywords :
Atomic force microscopy; Chemical analysis; Laboratories; Resists; Rough surfaces; Surface contamination; Surface morphology; Surface roughness; X-ray imaging; X-ray lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729926
Filename :
729926
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330614
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