Title :
Characterization Of Proximity Correction In 0.1 /spl mu/m Regime X-Ray Lithography
Author :
Yi, M. ; Seo, E. ; Seo, Y. ; Lee, K. ; Kim, O.
Author_Institution :
Pohang University of Science and Technology
Keywords :
Delay; Gold; Laboratories; Length measurement; Production; Resists; Shape measurement; Silicon compounds; Testing; X-ray lithography;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729927
