• DocumentCode
    330618
  • Title

    Chemical Vapor Deposition Of Tin Films From Tetrakis(methylethylamido)titanium And Ammonia

  • Author

    Lee, Jaegab ; Choi, Junghwan ; Cho, Heunglyul ; Lee, Eungu ; Shin, Hyunkook

  • Author_Institution
    Kookmin University
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    29
  • Lastpage
    30
  • Keywords
    Chemical vapor deposition; Chemistry; Conductivity; Crystallization; Degradation; Grain size; MOCVD; Metallization; Surface morphology; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.729933
  • Filename
    729933
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330618