مرکز منطقه ای اطلاع رساني علوم و فناوري - Chemical Vapor Deposition Of Tin Films From Tetrakis(methylethylamido)titanium And Ammonia

DocumentCode :

330618

Title :

Chemical Vapor Deposition Of Tin Films From Tetrakis(methylethylamido)titanium And Ammonia

Author :

Lee, Jaegab ; Choi, Junghwan ; Cho, Heunglyul ; Lee, Eungu ; Shin, Hyunkook

Author_Institution :

Kookmin University

fYear :

1998

fDate :

13-16 July 1998

Firstpage :

Lastpage :

Keywords :

Chemical vapor deposition; Chemistry; Conductivity; Crystallization; Degradation; Grain size; MOCVD; Metallization; Surface morphology; Tin;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location :

Kyoungju, South Korea

Print_ISBN :

4-930813-83-2

Type :

conf

DOI :

10.1109/IMNC.1998.729933

Filename :

729933

Link To Document :