DocumentCode

330624

Title

Application Of New Empirical Model To The Electron Beam Lithography Process With Chemically Amplified Resists

Author

Young-Mog Ham ; Cheol Hur ; Ki-Ho Baik

Author_Institution

Hyundai Electronics Industries Co. Ltd.

fYear

1998

fDate

13-16 July 1998

Firstpage

40

Lastpage

41

Keywords

Chemical analysis; Chemical engineering; Chemical industry; Chemical processes; Electron beams; Equations; Fabrication; Lithography; Resists; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729944

Filename

729944