DocumentCode :
330624
Title :
Application Of New Empirical Model To The Electron Beam Lithography Process With Chemically Amplified Resists
Author :
Young-Mog Ham ; Cheol Hur ; Ki-Ho Baik
Author_Institution :
Hyundai Electronics Industries Co. Ltd.
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
40
Lastpage :
41
Keywords :
Chemical analysis; Chemical engineering; Chemical industry; Chemical processes; Electron beams; Equations; Fabrication; Lithography; Resists; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729944
Filename :
729944
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330624
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