DocumentCode
330625
Title
Improved Electron-Beam / DUV Intra-Level Mix-and-Match As A Production Viable Lithography With 100-nm Resolution
Author
Magoshi, S. ; Niiyama, H. ; Sato, S. ; Kato, Y. ; Watanabe, Y. ; Shibata, T. ; Ito, M. ; Ando, A. ; Nakasugi, T. ; Sugihara, K. ; Okumura, K.
Author_Institution
Toshiba Corporation
fYear
1998
fDate
13-16 July 1998
Firstpage
42
Lastpage
43
Keywords
Error correction; Indium tin oxide; Laboratories; Lithography; Microprocessors; Polynomials; Production; Resists; Throughput; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.729947
Filename
729947
Link To Document