DocumentCode :
330626
Title :
Sub-10 nm Overlay Accuracy In Electron Beam Lithography For Nanometer-Scale Device Fabrication
Author :
Yamazaki, Kenji ; Fujiwara, Akira ; Takahashi, Yasuo ; Namatsu, Hideo ; Kurihara, Kenji
Author_Institution :
NTT Basic Research Laboratories
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
44
Lastpage :
45
Keywords :
Acceleration; Electron beams; Fabrication; Laser beams; Lithography; Nanoscale devices; Optical interferometry; Particle beams; Plasma measurements; Stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729948
Filename :
729948
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330626
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