Title :
Challenges For Next Generation Photomask
Author :
Morimoto, H. ; Okuyama, Y.
Author_Institution :
Semiconductor Leading Edge Technologies, Inc.
Keywords :
Costs; Fabrication; Lead compounds; Lithography; Reproducibility of results; Throughput; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729951
