DocumentCode

330627

Title

Challenges For Next Generation Photomask

Author

Morimoto, H. ; Okuyama, Y.

Author_Institution

Semiconductor Leading Edge Technologies, Inc.

fYear

1998

fDate

13-16 July 1998

Firstpage

46

Lastpage

46

Keywords

Costs; Fabrication; Lead compounds; Lithography; Reproducibility of results; Throughput; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729951

Filename

729951