مرکز منطقه ای اطلاع رساني علوم و فناوري - Process Technology For Next Generation Photomask

DocumentCode :

330628

Title :

Process Technology For Next Generation Photomask

Author :

Soh, Jung Min ; Choi, Sung Woon ; Kim, Byung Gook ; Kim, Jin Min ; Cha, Byung Cheol ; Yoon, Hee Sun

Author_Institution :

Samsung Electronics

fYear :

1998

fDate :

13-16 July 1998

Firstpage :

Lastpage :

Keywords :

Acceleration; Dry etching; Electron beams; Error correction; Fluctuations; Linearity; Resists; Throughput; Voltage; Writing;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location :

Kyoungju, South Korea

Print_ISBN :

4-930813-83-2

Type :

conf

DOI :

10.1109/IMNC.1998.729953

Filename :

729953

Link To Document :