Title :
Mask Patterning Challenges Beyond 150 nm
Author_Institution :
Etec Systems, Inc.
Keywords :
Bandwidth; Channel capacity; Heating; Lithography; Manufacturing processes; Product development; Semiconductor device manufacture; Shape; Throughput; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729954
