Title :
Reticle CD Latitude For Fabrication Of 0.18/spl mu/m Line Patterns
Author :
Matsuura, S. ; Uchiyama, T. ; Fujimoto, M. ; Yamazaki, T. ; Hashimoto, T. ; Kasama, K.
Author_Institution :
ULSI Device Development Labs., NEC Corp.
Keywords :
Electronics industry; Fabrication; Linearity; Proximity effect;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729955
