Title :
Lithography CAD Technology For Embedded Memory In Logic
Author :
Ohnuma, Hidetoshi ; Tsudaka, Keisuke ; Kawahira, Hiroichi ; Nozawa, Satoru
Author_Institution :
Sony Corporation
Keywords :
Application specific integrated circuits; Databases; Error correction; Lithography; Logic design; Logic devices; Optical design; Random access memory; Resists; Shape measurement;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729963
