DocumentCode :
330637
Title :
ArF Excimer Laser Lithography
Author :
Sasago, M.
Author_Institution :
Association of Super-Advanced Electronics Technologies (ASET)
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
66
Lastpage :
66
Keywords :
Costs; Electronics industry; Industrial electronics; Integrated optics; Lithography; Mass production; Optical attenuators; Optical devices; Resists; Semiconductor lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729967
Filename :
729967
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330637
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