DocumentCode

330644

Title

0.12 /spl mu/m Optical Lithography Performance Using an Alternating DUV Phase Shift Mask

Author

Trouiller, Y. ; Buffet, N. ; Mourier, T. ; Schiavone, P. ; Quere, Y.

Author_Institution

I. Leti

fYear

1998

fDate

13-16 July 1998

Firstpage

77

Lastpage

80

Keywords

Atomic measurements; Coatings; Etching; Force measurement; Linearity; Lithography; Metrology; Reflectivity; Resists; Scanning electron microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729976

Filename

729976