DocumentCode :
330644
Title :
0.12 /spl mu/m Optical Lithography Performance Using an Alternating DUV Phase Shift Mask
Author :
Trouiller, Y. ; Buffet, N. ; Mourier, T. ; Schiavone, P. ; Quere, Y.
Author_Institution :
I. Leti
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
77
Lastpage :
80
Keywords :
Atomic measurements; Coatings; Etching; Force measurement; Linearity; Lithography; Metrology; Reflectivity; Resists; Scanning electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729976
Filename :
729976
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330644
