• DocumentCode
    330657
  • Title

    Illumination Condition And Mask Bias For 0.18/spl mu/m Pattern With KrF Lithography

  • Author

    Tabuchi, H. ; Shichijo, Y. ; Okabe, I. ; Oka, N. ; Inoue, M. ; Iguchi, Kenichi

  • Author_Institution
    VLSI Development Laboratories IC Group SHARP Corporation
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    102
  • Lastpage
    103
  • Keywords
    Health information management; Isolation technology; Laboratories; Laser tuning; Lighting; Lithography; Manufacturing; Optical design; Process control; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.729992
  • Filename
    729992
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330657