Title :
Illumination Condition And Mask Bias For 0.18/spl mu/m Pattern With KrF Lithography
Author :
Tabuchi, H. ; Shichijo, Y. ; Okabe, I. ; Oka, N. ; Inoue, M. ; Iguchi, Kenichi
Author_Institution :
VLSI Development Laboratories IC Group SHARP Corporation
Keywords :
Health information management; Isolation technology; Laboratories; Laser tuning; Lighting; Lithography; Manufacturing; Optical design; Process control; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729992
