Sub 0.1-/spl mu/m Pattern Fabrication Using a 193-nm TSI Process

Author

Mori, Shigeyasu ; Kuhara, Koichi ; Morisawa, Taku ; Matsuzawa, Nobuyuki ; Kalmoto, Y. ; Endo, Masayuki ; Matsuo, Takahiro ; Sasago, Masaru

Author_Institution

Yokohama Research Center Association of Super-Advanced Electronics Technologies (ASET)

fYear

1998

fDate

13-16 July 1998

Firstpage

104

Lastpage

105

Keywords

Chemicals; Chromium; Dry etching; Fabrication; Lithography; Plasma applications; Plasma chemistry; Resists; Space technology; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

DOI

10.1109/IMNC.1998.729993

Filename

729993

Link To Document