Title :
Thermal Distortion Of An X-Ray Mask For Synchrotron Radiation Lithography
Author :
Yang, J. ; Kawachi, S. ; Toyota, E.
Author_Institution :
Sumitomo Heavy Industries, Ltd.
Keywords :
Biomembranes; Lithography; Mirrors; Optical beams; Optical control; Optical distortion; Shape; Strontium; Synchrotron radiation; Temperature;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729999