DocumentCode :
330666
Title :
A Research On The Anisotropic Etching Of Tungsten-Nitride For X-Ray Mask
Author :
Lee, H.G. ; Jeong, C.Y. ; Lee, S.Y. ; Ahn, J. ; Song, K.C. ; Park, C.K. ; Jeon, Y.S. ; Lee, D.H.
Author_Institution :
Hanyang University
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
121
Lastpage :
122
Keywords :
Anisotropic magnetoresistance; Atomic measurements; Cooling; Etching; Gases; Lithography; Maintenance engineering; Power measurement; Strontium; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730003
Filename :
730003
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330666
