DocumentCode
330668
Title
Impact Of Metallization Films On Scattered-Light Alignment For X-Ray Lithography
Author
Miyatake, Tsuomu ; Hirose, Masaoki ; Shoki, Tsutomu ; Ohkubo, Ryo ; Yamazaki, Kuniaki
Author_Institution
Sumitomo Heavy Industries, Ltd.
fYear
1998
fDate
13-16 July 1998
Firstpage
125
Lastpage
126
Keywords
Aluminum; Artificial intelligence; Atherosclerosis; Metallization; Particle scattering; Semiconductor films; Testing; Thickness measurement; X-ray lithography; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730005
Filename
730005
Link To Document