DocumentCode :
330669
Title :
Improvement Of Overlay Accuracy In SR Lithography For Gigabit-Scale Dram Fabrication
Author :
Suita, Muneyoshi ; Hifumi, Takashi ; Sumitani, Hiroaki ; Itoga, Kenji ; Ootera, Hiroki ; Marumoto, Kenji ; Wakamiya, Wataru ; Matsumoto, Takahiro ; Yamamoto, Takeshi ; Edo, Ryo ; Ohishi, Satoru ; Sentoku, Koichi
Author_Institution :
Mitsubishi Electric Corp.
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
127
Lastpage :
128
Keywords :
Error correction; Fabrication; Laboratories; Lithography; Nanotechnology; Random access memory; Research and development; Resists; Strontium; Synchrotrons;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730006
Filename :
730006
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330669
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