• DocumentCode
    330670
  • Title

    Sub-0.1-/spl mu/m Patterning Characteristics of Inorganic Resists by Focused-Ion-Beam Lithography

  • Author

    Paek, Seung Woo ; Park, Soo-Ho ; Lee, Hyun Yong ; Chung, Hong Bay

  • Author_Institution
    Kwangwoon University
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    129
  • Lastpage
    130
  • Keywords
    Annealing; Dry etching; Inorganic materials; Polymers; Resists; Solvents; Substrates; Vacuum technology; Water; X-ray lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.730007
  • Filename
    730007
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330670