DocumentCode :
330672
Title :
Proximity Effect Correction By Pattern Modified Stencil Mask In Large Field Projection Electron-Beam Lithography
Author :
Kobinata, Hideo ; Yamashita, Hiroshi ; Nomura, Eiichi ; Nozue, Hiroshi
Author_Institution :
NEC Corporation
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
132
Lastpage :
133
Keywords :
Acceleration; Backscatter; Electron beams; Lithography; National electric code; Proximity effect; Resists; Throughput; Ultra large scale integration; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730009
Filename :
730009
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330672
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