• DocumentCode
    330672
  • Title

    Proximity Effect Correction By Pattern Modified Stencil Mask In Large Field Projection Electron-Beam Lithography

  • Author

    Kobinata, Hideo ; Yamashita, Hiroshi ; Nomura, Eiichi ; Nozue, Hiroshi

  • Author_Institution
    NEC Corporation
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    132
  • Lastpage
    133
  • Keywords
    Acceleration; Backscatter; Electron beams; Lithography; National electric code; Proximity effect; Resists; Throughput; Ultra large scale integration; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.730009
  • Filename
    730009
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330672