Title :
Li2B4O7 membrane resonator for VHF band and its application
Author :
Ono, M. ; Sakai, M. ; Fujiwara, Y. ; Wakatsuk, N.
Author_Institution :
Fujitsu Ltd., Suzaka, Japan
Abstract :
A Li2B4O7 membrane resonator has been developed to operate in the fundamental thickness shear mode in the VHF range. 51° rot Y cut Li2B4O7 was used for the substrate. The membrane was fabricated by conventional wet etching technology. This resonator has a center frequency of 72.5 MHz, Q factor of 1330 and capacitance ratio about 67. The temperature characteristics of the resonance frequency shows a parabola and the second order temperature coefficient is -0.26 ppm/°C2. Using this resonator in a VCO circuit, low noise oscillation with a variable frequency range of 0.2% and C/N of 80 dB was obtained
Keywords :
Q-factor; VHF filters; crystal resonators; etching; lithium compounds; membranes; passive filters; resonator filters; thermal stability; ultrasonic devices; 72.5 MHz; Li2B4O7; Li2B4O7 membrane resonator; Q-factor; VCO circuit; VHF band; Y cut Li2B4O7 substrate; capacitance ratio; fundamental thickness shear mode; low noise oscillation; resonance frequency; temperature characteristics; variable frequency range; wet etching technology; Biomembranes; Chemicals; Continuous wavelet transforms; Electrodes; Etching; FAA; Fabrication; Lapping; Samarium; Stress;
Conference_Titel :
Ultrasonics Symposium, 1997. Proceedings., 1997 IEEE
Conference_Location :
Toronto, Ont.
Print_ISBN :
0-7803-4153-8
DOI :
10.1109/ULTSYM.1997.661760
