DocumentCode :
330703
Title :
Fabrication Of A Nanometer-Scale Si Wire By Micromachining Of A Silicon-on-Insulator Substrate
Author :
Fujii, H. ; Kanemaru, S. ; Hiroshima, H. ; Yokoyama, H. ; Itoh, J.
Author_Institution :
Electrotechnical Laboratory
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
194
Lastpage :
195
Keywords :
Chemical sensors; Etching; Fabrication; Micromachining; Nanoscale devices; Nanostructures; Oxidation; Silicon on insulator technology; Surface emitting lasers; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730040
Filename :
730040
Link To Document :
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