• DocumentCode
    330703
  • Title

    Fabrication Of A Nanometer-Scale Si Wire By Micromachining Of A Silicon-on-Insulator Substrate

  • Author

    Fujii, H. ; Kanemaru, S. ; Hiroshima, H. ; Yokoyama, H. ; Itoh, J.

  • Author_Institution
    Electrotechnical Laboratory
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    194
  • Lastpage
    195
  • Keywords
    Chemical sensors; Etching; Fabrication; Micromachining; Nanoscale devices; Nanostructures; Oxidation; Silicon on insulator technology; Surface emitting lasers; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.730040
  • Filename
    730040
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330703