DocumentCode :
330704
Title :
Fabrication Of Nanometric Aperture Arrays By Wet Anisotropic Etching For Near-Field Optical Memory Application
Author :
Lee, M.B. ; Tsutsui, K. ; Ohtsu, M. ; Atoda, N.
Author_Institution :
National Institute for Advanced Interdisciplinary Research
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
196
Lastpage :
197
Keywords :
Anisotropic magnetoresistance; Apertures; Geometrical optics; Lithography; Optical arrays; Optical device fabrication; Optical films; Optical recording; Probes; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730041
Filename :
730041
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330704
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