DocumentCode :
330713
Title :
Negative Ion Formation In SiO/sub 2/ Etching Using A Pulsed ICP Plasma
Author :
Choi, Chang Ju ; Kwon, O. Sung ; Seol, Yeo Song
Author_Institution :
Hyundai Electronics Industries Co., Ltd.
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
215
Lastpage :
216
Keywords :
Distribution functions; Electrons; Etching; Plasma applications; Plasma density; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730051
Filename :
730051
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330713
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