DocumentCode
330713
Title
Negative Ion Formation In SiO/sub 2/ Etching Using A Pulsed ICP Plasma
Author
Choi, Chang Ju ; Kwon, O. Sung ; Seol, Yeo Song
Author_Institution
Hyundai Electronics Industries Co., Ltd.
fYear
1998
fDate
13-16 July 1998
Firstpage
215
Lastpage
216
Keywords
Distribution functions; Electrons; Etching; Plasma applications; Plasma density; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730051
Filename
730051
Link To Document